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New Arrival China Titanium Sputtering Target - high purity round shape 99.95% Mo material 3N5 Molybdenum sputtering target for glass coating & decoration – HSG Metal

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New Arrival China Titanium Sputtering Target - high purity round shape 99.95% Mo material 3N5 Molybdenum sputtering target for glass coating & decoration – HSG Metal Detail:

Product parameters

Brand Name HSG Metal
Model Number HSG-moly target
Grade MO1
Melting point(℃) 2617
Processing  Sintering/ Forged
Shape Special Shape Parts
Material Pure molybdenum
Chemical Composition Mo:> =99.95%
Certificate ISO9001:2015
Standard ASTM B386
Surface Bright and Ground Surface
Density 10.28g/cm3
Color Metallic Luster
Purity Mo:> =99.95%
Application PVD coating film in glass industry , ion plating
Advantage High Temperature Resistance, High Purity, Better Corrosion Resistance

Standard availability is described below. Other sizes and tolerances are available.

Thickness

Max. Width

Max. Length

.090″

24″

110″

.125″

24″

80″

.250″

24″

40″

.500″

24″

24″

>.500″

24″

For greater thickness, plate products are normally limited to 40 kilograms maximum weight per piece.Molybdenum Plate Standard Thickness Tolerance

Thickness

.25″ to 6″

6″ to 12″

12″ to 24″

.090″

± .005″

± .005″

± .005″

> .125

± 4%

± 4%

± 4%

Molybdenum Plate Standard Width Tolerance

Thickness

.25″ to 6″

6″ to 12″

12″ to 24″

.090″

± .031″

± .031″

± .031″

> .125

± .062″

± 062″

± 062″

Note

Sheet ( 0.13mm ≤thickness ≤ 4.75mm )

Plate ( thickness >4.75mm )

Other dimensions can be negotiated.

Molybdenum target is an industrial material, widely used in conductive glass, STN/TN/TFT-LCD, optical glass, ion coating and other industries. It is suitable for all flat coating and spin coating systems.

The molybdenum target has a density of 10.2 g/cm3. The melting point is 2610°C. The boiling point is 5560°C.

Purity of molybdenum target: 99.9%, 99.99%

Specifications: round target, plate target, rotating target

Feature

Excellent conductivity of electricity ;
Resistance of high temperature;
High melting point, high oxidation and erosion resistance.

Application

Widely used as electrodes or wiring material,in the semiconductor integrated circuit, flat panel display and solar panel manufacturing and other fields. At the same time, we have the production of tungsten, tantalum target, niobium target,copper target, the specific dimensions of production in accordance with customer requirements.


Product detail pictures:

New Arrival China Titanium Sputtering Target - high purity round shape 99.95% Mo material 3N5 Molybdenum sputtering target for glass coating & decoration – HSG Metal detail pictures


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We'll make every effort and hard work to be superb and excellent, and speed up our steps for standing inside the rank of intercontinental top-grade and high-tech enterprises for New Arrival China Titanium Sputtering Target - high purity round shape 99.95% Mo material 3N5 Molybdenum sputtering target for glass coating & decoration – HSG Metal , The product will supply to all over the world, such as: South Korea, US, Moldova, We insist on the principle of "Credit being primary, Customers being the king and Quality being the best", we are looking forward to the mutual cooperation with all friends at home and abroad and we will create a bright future of business.
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